29 June 1984 Cad As The Foundation For Quality Assurance In VLSI Fabrication
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Abstract
Fabrication of VLSI devices with complex designs and one micron geometries presents a major challenge in the area of quality assurance. The original CAD design can be used as the reference for inspection, if a mechanism is provided for compensating for the effects of the process on the design. Using this approach, Contrex has developed a system for wafer inspection that accurately predicts the shape of a pattern in photoresist, and is able to detect defects as small as 0.3 microns.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raul Brauner, Raul Brauner, David Pollock, David Pollock, David Bedrosian, David Bedrosian, } "Cad As The Foundation For Quality Assurance In VLSI Fabrication", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941924; https://doi.org/10.1117/12.941924
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