Characterization Of Optical Properties Of Chromium Substrates And Linewidth Control For Mask Making

L C Hsia

doi:10.1117/12.941920

29 June 1984 Characterization Of Optical Properties Of Chromium Substrates And Linewidth Control For Mask Making

L C Hsia

Proceedings Volume 0470, Optical Microlithography III: Technology for the Next Decade; (1984) https://doi.org/10.1117/12.941920
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

Optical properties of thin Cr/Crx0y films sputtered on glass for photomask making are investigated using Auger spectroscopy, ellipsometry and ref lectometry techniques. The films selected for the study vary from oxygen very rich to very poor. The complex indices of refraction are derived from the ellipsometry data using metal film calculation. The reflectance is then calculated to compare with that directly measured. These comparisons are important in understanding the film properties and their application in microlithography. The optical properties are found to be closely related to the oxygen concentration and its profile in the film. Optical intensity profiles in the photoresist are calculated for various photoresist/Cr/Crx0 systems, yielding optimal conditions for min4izing resist line-width variations. An experiment is also carried out to illustrate the main points predicted by the theory.

Citation Download Citation

L C Hsia "Characterization Of Optical Properties Of Chromium Substrates And Linewidth Control For Mask Making", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941920

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