29 June 1984 Multiple Layer Techniques In Optical Lithography: Applications To Fine Line Mos Production
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Abstract
The theory and practical concerns of multi-layer techniques using an anti-reflective polymer coating will be discussed. Anti Reflective Coating (ARC, Brewer Science, Inc.) was incorporated into the metal lithography process for a 1.2 micron gate CMOS prototype production line. Previously, reflections from substrate topography had caused a loss in linewidth control. These reflections were minimized by the ARC, which also restored process latitude. For the process described, ARC coating uniformity was ± nm, adhesion was good, and step coverage was seen to be adequate to 0.8 micron high verticle wall steps.
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M A Listvan, M. Swanson, A. Wall, S A. Campbell, "Multiple Layer Techniques In Optical Lithography: Applications To Fine Line Mos Production", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941894; https://doi.org/10.1117/12.941894
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