18 January 1985 Effect Of Anomalous Plasma Resistivity (APR) In Longitudinal Discharge Of Copper Vapour Laser (CVL)
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Proceedings Volume 0473, Symposium Optika '84; (1985) https://doi.org/10.1117/12.942424
Event: Symposium Optika '84, 1984, Budapest, Hungary
Abstract
It is shown for the first time, that in longitudinal discharge copper vapour lasers an effect of anomalous plasma resistivity occurs. At the time of APR the largest part of active energy passes into the discharge. The proper understanding of APR in the conditions of CVL, would enable the correct understanding of the mechanism of exitation and laser generation as well as the further improvement of its output parameters.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
O. R. Marazov, St. Stoilov, "Effect Of Anomalous Plasma Resistivity (APR) In Longitudinal Discharge Of Copper Vapour Laser (CVL)", Proc. SPIE 0473, Symposium Optika '84, (18 January 1985); doi: 10.1117/12.942424; https://doi.org/10.1117/12.942424
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