Paper
15 October 1984 An Ellipsometry System For High Accuracy Metrology Of Thin Films
George A. Candela, Deane Chandler-Horowitz
Author Affiliations +
Proceedings Volume 0480, Integrated Circuit Metrology II; (1984) https://doi.org/10.1117/12.943040
Event: 1984 Technical Symposium East, 1984, Arlington, United States
Abstract
A computer-controlled spectroscopic ellipsometer of high accuracy has been designed and constructed. A theta-two-theta goniometer unit and optical rail system allows various ellipsometric methods to be used to measure the parameters A and 4). Three important methods under study for accuracy, precision, and speed of measurement are the conventional null method, the rotating analyzer method, and the principal angle method. All the goniometer angles, including the angle of incidence, can be measured to an accuracy of 0.001 deg. The present light sources are two lasers with fixed wavelengths, 632.8 nm and 441.6 nm, in addition to a monochromator that can be used to scan the wavelength range from 190 to 2600 nm. A unique sample alignment system which utilizes two quadrant detectors has been developed and a simple but very effective nulling scheme is used. This instrument is primarily used for the metrology of semiconductor materials and for the calibration of reference standards for thin film thickness and refractive index.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
George A. Candela and Deane Chandler-Horowitz "An Ellipsometry System For High Accuracy Metrology Of Thin Films", Proc. SPIE 0480, Integrated Circuit Metrology II, (15 October 1984); https://doi.org/10.1117/12.943040
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Cited by 7 scholarly publications and 1 patent.
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KEYWORDS
Sensors

Ellipsometry

Polarizers

Metrology

Calibration

Signal processing

Semiconducting wafers

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