15 October 1984 Fourier Transform Method For Optical Linewidth Measurement
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Proceedings Volume 0480, Integrated Circuit Metrology II; (1984) https://doi.org/10.1117/12.943050
Event: 1984 Technical Symposium East, 1984, Arlington, United States
A new method for linewidth measurement on wafers is proposed. Owing to a Fourier transformation this method makes use of a good deal of the information available in the optical image. It applies in the 1 pm to 6 pm range by-passing data such as the thickness and optical index of the material being measured, provided that the line itself is less than 500 nm thick. Only the image sensor has to be calibrated i.e. no standard reference material is needed. Repeatability of linewidth measurement is within 0.01 μm, and accuracy is ± 0.5 % in the whole range of validity of the model presented.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M . E. Guillaume, M . E. Guillaume, N. M. Noailly, N. M. Noailly, J. C. Reynaud, J. C. Reynaud, J. L. Buevoz, J. L. Buevoz, } "Fourier Transform Method For Optical Linewidth Measurement", Proc. SPIE 0480, Integrated Circuit Metrology II, (15 October 1984); doi: 10.1117/12.943050; https://doi.org/10.1117/12.943050

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