28 June 1984 Liquid-Phase Laser Surface Modification
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Proceedings Volume 0482, Applications of Laser Chemistry & Diagnostics; (1984) https://doi.org/10.1117/12.943112
Event: 1984 Technical Symposium East, 1984, Arlington, United States
Abstract
Several laser-controlled thermal and photochemical processes at liquid/solid interfaces are described. These include etching of silicon dioxide and copper in a number of aqueous and organic solvents. Reactions range from simple, thermally-enhanced types to photo-chemically sensitized systems. Advantages and limitations of the liquid phase in surface processing are discussed.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Terence Donohue, Terence Donohue, } "Liquid-Phase Laser Surface Modification", Proc. SPIE 0482, Applications of Laser Chemistry & Diagnostics, (28 June 1984); doi: 10.1117/12.943112; https://doi.org/10.1117/12.943112
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