Fabrication And Optimization Of X-Ray And VUV-Gratings

M. Breidne; L. Mattsson

doi:10.1117/12.944818

12 December 1984 Fabrication And Optimization Of X-Ray And VUV-Gratings

M. Breidne, L. Mattsson

Proceedings Volume 0503, Application, Theory, and Fabrication of Periodic Structures, DiffractionGratings, and Moire Phenomena II; (1984) https://doi.org/10.1117/12.944818
Event: 28th Annual Technical Symposium, 1984, San Diego, United States

Abstract

An ion-etching technique for fabrication of X-ray and VUV gratings will be presented. A photoresist grating, made holographically, is bombarded by Ar-ions and the grating profile is transfered into the substrate. By using a theoretical formalism based on the Rayleigh theory the profile that gives the highest efficiency for a given mounting can be calculated. We will discuss how to design the photoresist grating and the etch process in order to obtain the optimal profile. Measured efficiency curves at λ=44 Å will be presented.

Citation Download Citation

M. Breidne and L. Mattsson "Fabrication And Optimization Of X-Ray And VUV-Gratings", Proc. SPIE 0503, Application, Theory, and Fabrication of Periodic Structures, DiffractionGratings, and Moire Phenomena II, (12 December 1984); https://doi.org/10.1117/12.944818

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available