12 November 1984 Vibration Sensor Using Planar Integrated Interferometric Circuit On Oxidised Silicon Substrate
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Proceedings Volume 0514, 2nd Intl Conf on Optical Fiber Sensors: OFS'84; (1984) https://doi.org/10.1117/12.945078
Event: 2nd International Conference on Optical Fiber Sensors, 1984, Stuttgart, Germany
Abstract
We present the first test of a planar integrated optical interferome-trer used as a microdisplacement or vibration sensor. A schematic diagram of this device is shown figure 1. Essentially, it is a Michelson interferometer achieved with our classical planar structure Si/SiO2/Si3N4/SiO2 [1-2] including : . the grating coupler operating in the third order (period = 2μm) ; . the beam splitter, achieved by local etching of the SiO2 over-layer ; . two mirrors also obtained by etching of the silica followed by an aluminium deposition, in order to lower the T.I.R.* angle ; . and two cleaved faces.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Gidon, P. Gidon, S. Valette, S. Valette, P. Schweizer, P. Schweizer, } "Vibration Sensor Using Planar Integrated Interferometric Circuit On Oxidised Silicon Substrate", Proc. SPIE 0514, 2nd Intl Conf on Optical Fiber Sensors: OFS'84, (12 November 1984); doi: 10.1117/12.945078; https://doi.org/10.1117/12.945078
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