12 June 1985 Properties Of Optical Elements With Ultra-High Spatial Frequency Surface Corrugations
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Proceedings Volume 0523, Applications of Holography; (1985); doi: 10.1117/12.946292
Event: 1985 Los Angeles Technical Symposium, 1985, Los Angeles, United States
Abstract
In this paper we discuss the properties of optical elements fabricated by holographically recording an ultra-high spatial-frequency pattern in a photoresist mask followed by reactive ion etching to transfer this pattern into the surface of a quartz substrate. Such optical elements are envionmentally durable, potentially easy to replicate, and exhibit diffraction efficiencies in excess of 85%. In addition, two other properties are reported. Such elements at normal (00) incidence are antireflective, with broadband reflection coefficients as low as 0.035%. Also, the elements exhibit artificially produced birefringence making them useful as wave plates. These results may be particularly significant in the UV and IR, where damage-resistant antireflection coatings and transparent birefringent materials may not exist.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven K. Case, Rolf C. Enger, "Properties Of Optical Elements With Ultra-High Spatial Frequency Surface Corrugations", Proc. SPIE 0523, Applications of Holography, (12 June 1985); doi: 10.1117/12.946292; https://doi.org/10.1117/12.946292
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KEYWORDS
Reflectivity

Quartz

Photoresist materials

Optical components

Etching

Diffraction gratings

Wave plates

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