This paper will discuss the application of Rutherford backscattering technology and secondary ion mass spectrometry to advanced ion beam processes. Two particular processes, high current implantation and high energy implantation will be investigated.
Michael D. Strathman,
"Materials Characterization Tools For Advanced Ion Beam Processes", Proc. SPIE 0530, Advanced Applications of Ion Implantation, (9 April 1985); doi: 10.1117/12.946483; https://doi.org/10.1117/12.946483