20 June 1985 A High Performance Negative X-Ray Resist : CPMS-X(Pd)
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Abstract
The characteristics of CPMS (chlorinated polymethylstyrene) to Pd Loc were investigated to obtain the high performance negative x-ray resist. From the results, the high sensitive x-ray negative resist (Dg0.5=17mJ/cm2), CPMS-X(Pd), were obtained by determining both the optimum molecular weight and the optimum chlorine content to Pd Loc. It was found that this resist also has both high contrast and high dry etching resistivity. This resist can be believed to be a milestone for practical use of x-ray lithography for future VLSI devices.
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Nobuyuki Yoshioka, Yoshiki Suzuki, Teruhiko Yamazaki, "A High Performance Negative X-Ray Resist : CPMS-X(Pd)", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947485; https://doi.org/10.1117/12.947485
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