A Sub-Micron Electron Beam Lithography System For Laboratory Use

Shizuo Kimoto; Hajime Kohinata

doi:10.1117/12.947499

20 June 1985 A Sub-Micron Electron Beam Lithography System For Laboratory Use

Shizuo Kimoto, Hajime Kohinata

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947499
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A simple, low cost, multipurpose electron beam lithography system for sub-micron pattern was developed for personal use in laboratory. It has a capability of circle pattern generation and saves a time of pattern drawing for development of new device. There are several examples of fine pattern with few-tenth μm line and space which are drawn by the system.

Citation Download Citation

Shizuo Kimoto and Hajime Kohinata "A Sub-Micron Electron Beam Lithography System For Laboratory Use", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947499

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