20 June 1985 Development of a Nanometric E-Beam Lithography System (JBX-5DII)
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The production of VHSIC and microwave devices has shown that submicron lithography by E-beam, Optical, or X-ray systems is rapidly becoming feasible. There is, however, a developing demand for a nanolithography tool for producing Josephson, GaAs, optoelectronic devices and for investigating the physics of scaling of semiconductor devices.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M.Hassel Shearer, H. Takemura, M. Isobe, N. Goto, K. Tanaka, S. Miyauchi, "Development of a Nanometric E-Beam Lithography System (JBX-5DII)", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947479; https://doi.org/10.1117/12.947479

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