20 June 1985 Development of a Nanometric E-Beam Lithography System (JBX-5DII)
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Abstract
The production of VHSIC and microwave devices has shown that submicron lithography by E-beam, Optical, or X-ray systems is rapidly becoming feasible. There is, however, a developing demand for a nanolithography tool for producing Josephson, GaAs, optoelectronic devices and for investigating the physics of scaling of semiconductor devices.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M.Hassel Shearer, M.Hassel Shearer, H. Takemura, H. Takemura, M. Isobe, M. Isobe, N. Goto, N. Goto, K. Tanaka, K. Tanaka, S. Miyauchi, S. Miyauchi, } "Development of a Nanometric E-Beam Lithography System (JBX-5DII)", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947479; https://doi.org/10.1117/12.947479
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