Digital Processing Of Beam Signals In A Variably Shaped Electron Beam Lithography System

G. Matsuoka; H. Yokouchi; M. Okumura; T. Matsuzaka; N. Saitou; N. Nakamura

doi:10.1117/12.947483

20 June 1985 Digital Processing Of Beam Signals In A Variably Shaped Electron Beam Lithography System

G. Matsuoka, H. Yokouchi, M. Okumura, T. Matsuzaka, N. Saitou, N. Nakamura

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947483
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

This paper discusses signal processing procedures which have been developed for three important beam adjustments required by variably shaped electron beam lithography systems: dynamic focussing adjustment, deflection distortion correction and beam size adjustment. Precise and speedy measurement of edge slope, beam position and beam size are all necessary in this context. To execute these measurements, backscattered electron signals are stored in a buffer memory following digital scanning of a shaped beam across a fiducial mark. These signals are then digitally processed in a control computer. These procedures have been applied to an EB lithography system (HL-600). Pattern accuracy of 0.2 μm over a 6.5x6.5 mm field and overlay accuracy of 0.1 μm were obtained.

Citation Download Citation

G. Matsuoka, H. Yokouchi, M. Okumura, T. Matsuzaka, N. Saitou, and N. Nakamura "Digital Processing Of Beam Signals In A Variably Shaped Electron Beam Lithography System", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947483

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