20 June 1985 Measuring The Performance Of The AEBLE tm 150 Direct-Write A-Beam Lithography Equipment
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Abstract
Lithographic pattern quality is of paramount importance for the fabrication of microcircuits with submicrometer critical dimensions. The AEBLE 150 direct-write e-beam lithography equipment recently announced by Perkin-Elmer is destined for application in the submicrometer domain, and it will employ on-line quality measurement tools to ensure consistent machine performance and productivity. In this paper, we discuss the strategies to be employed in developing pattern quality measurement tools for AEBLE, and we illustrate early results obtained using the prototype AEBLE and mensuration techniques developed for Perkin-Elmer's mask-making product, MEBES® III. These preliminary results will be used to guide the evolution of AEBLE's quality-assurance tools. We present a scenario for that evolution, including a discussion of measurable parameters and user interfaces.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Allen M. Carroll, Allen M. Carroll, Jorge L. Freyer, Jorge L. Freyer, } "Measuring The Performance Of The AEBLE tm 150 Direct-Write A-Beam Lithography Equipment", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947482; https://doi.org/10.1117/12.947482
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