20 June 1985 Recent Advances Of Optical Step-And-Repeat System
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Abstract
The current model of an optical step and repeat system for use in production line has a projection lens with a resolution of l.0m and provides a machine-to-machine overlay accuracy of approximately ±0.2 pm (95% range). The accuracy is to be further improved with a newly developed field-by-field alignment system. The i-line projection lens, developed for higher resolution, adequately resolves 0.8um lines and spaces.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. Shiotake, N. Shiotake, S. Yoshida, S. Yoshida, } "Recent Advances Of Optical Step-And-Repeat System", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947498; https://doi.org/10.1117/12.947498
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