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20 June 1985 Recent Printing And Registration Results With X-Ray Lithography
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Abstract
X-ray lithography has matured from a research and development phase to an implementation phase. Accordingly, the concerns have shifted from imaging issues to those of registration, critical dimension control, step height coverage, and system repeatability. In this paper, results will be discussed relating to x-ray printing and registration for full field alignment systems with 100mm field diameter using optical verniers, SEM (scanning electron microscope) and electrical wafer probe techniques. These results will encompass micrometer and submicrometer imaging using single 'level and tri-level processing techniques.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. Fay, L. Tai, and D. Alexander "Recent Printing And Registration Results With X-Ray Lithography", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947486
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