Application Of A Contrast Enhancement Material To Broadband Projection Printing

Edward K. Pavelchek; Vivian B. Valenty; Robert E. Williams,Jr.

doi:10.1117/12.947750

23 July 1985 Application Of A Contrast Enhancement Material To Broadband Projection Printing

Edward K. Pavelchek, Vivian B. Valenty, Robert E. Williams,Jr.

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947750
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A Contrast Enhancement Material (CEM), G.E. Altilith CEM-388, has been gaining acceptance on semiconductor fabrication lines using h line step-and-repeat systems. Although a bilevel system, the use of CEM-388 is relatively simple, and has shown significant increases in practical resolution when used at 405 nm. A considerable advantage may also be gained by using this system with Micralign projection printers, especially in improving resolution over steps. This paper will present the practical aspects of using CEM-388 in such systems and illustrate the effects on resolution, step coverage, C.D. control, and wafer throughput. The presence and control of inhibition effects will also be discussed.

Citation Download Citation

Edward K. Pavelchek, Vivian B. Valenty, and Robert E. Williams,Jr. "Application Of A Contrast Enhancement Material To Broadband Projection Printing", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947750

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