23 July 1985 One Micron 1X Stepper Photolithography: An Introductory View
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A feasibility study of 1X optical stepper for one micron lithography in a manufacturing environment is conducted. The present discussion concentrates on the availability and per-formance of production-worthy 1X optical stepper, and the manufacturability of one micron reticle including the 0.5μm defect inspection. The Ultratech Stepper Model 1000 with one micron lens and the KLA-208 automatic reticle inspection system are evaluated and their performances are discussed.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark S. Chang, "One Micron 1X Stepper Photolithography: An Introductory View", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947744; https://doi.org/10.1117/12.947744

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