23 July 1985 PROLITH: A Comprehensive Optical Lithography Model
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Proceedings Volume 0538, Optical Microlithography IV; (1985); doi: 10.1117/12.947767
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States
Abstract
The Positive Resist Optical Lithography model (PROLITH) is introduced. The model predicts resist profiles for submicron projection, proximity and contact printing. Included are models for optical projection systems, the standing wave effect for projection printing, a diffraction model for contact printing, a kinetic model for the exposure reaction, and a kinetic model of the development process. Also included in PROLITH are the effects of prebake conditions and polychromatic exposure.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack, "PROLITH: A Comprehensive Optical Lithography Model", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947767; https://doi.org/10.1117/12.947767
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KEYWORDS
Printing

Optical lithography

Picture Archiving and Communication System

Systems modeling

Photoresist materials

Diffraction

Diffusion

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