18 April 1985 EBR-9 Development In Heated Environment
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Abstract
EBR-9, a positive E-beam resist, was developed in Japan as a possible replacement for PBS with wider processing latitude. The MIBK/IPA develope5 systems took 8-15 minutes in immersion development to yield sensitivities below 1 uC/cm2 at 10 kV at temperatures of 25-30oC. The newer developer, Developer V, can be used either with immersion or heated nitrogen-assisted spray development to give similar sensitivity but with higher contrast, at shorter development time. Solubility rate data are also presented. Our results show this to be another milestone toward a resist system with more process latitude than the standard PBS process.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Samuel S.M. Fok, Patrick P. Tang, Keith Standiford, "EBR-9 Development In Heated Environment", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947850; https://doi.org/10.1117/12.947850
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