18 April 1985 Linewidth Control In Optical Projection Printing: Influence Of Resist Parameters
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Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985); doi: 10.1117/12.947836
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States
Abstract
Photoresist linewidth profiles for optical projection printing with high performance stepper lenses were simulated using the SAMPLE program. Profile slopes and linewidth variations of resist structures on profiled surfaces (silicon and aluminum substrates) have been investigated in dependance on photoresist parameters such as optical absorption coefficient and thickness of the photoresist as well as exposure/development time. The study also discusses the influence of exposure wavelength (g-line vs. h-line vs. i-line) on line edge slope and standing wave effects.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Arden, Leonhard Mader, "Linewidth Control In Optical Projection Printing: Influence Of Resist Parameters", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947836; https://doi.org/10.1117/12.947836
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KEYWORDS
Photoresist materials

Absorption

Aluminum

Critical dimension metrology

Silicon

Projection systems

Lenses

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