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18 April 1985 Negative-Working E-Beam Copolymers
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Abstract
Copolymers of allyl methacrylate and propargyl methacrylate have very high speed as electron-beam and x-ray resists. They produce polymers of a structural complexity not often encountered in addition polymerization. The structural variety available in allyl methacrylate polymers gives them unusual properties, which consequently enhance their microlithographic performance.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert C. Daly, Michael J. Hanrahan, and Richard W. Blevins "Negative-Working E-Beam Copolymers", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947826
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