Optical Positive Resist Processing. II. Experimental And Analytical Model Evaluation Of Process Control.

Michael P.C. Watts; M.Richard Hannifan

doi:10.1117/12.947810

18 April 1985 Optical Positive Resist Processing. II. Experimental And Analytical Model Evaluation Of Process Control.

Michael P.C. Watts, M.Richard Hannifan

Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985) https://doi.org/10.1117/12.947810
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A new analytical model of the exposure and development of optical positive resists is used to quantitatively evaluate process control. Using this model, a new method is described that allows for the rapid extraction of the characteristics parameters that describe the exposure and development of resists. Characteristic parameters were measured for AZ 1300SF in two concentrations of AZ 351 and AZ developers, respectively. Line width variations that would result from specific process variations were calculated for the different developers. It is clearly shown that dilute developers operating at optimal exposure doses give the best control.

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Michael P.C. Watts and M.Richard Hannifan "Optical Positive Resist Processing. II. Experimental And Analytical Model Evaluation Of Process Control.", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947810

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