18 April 1985 Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation
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Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985); doi: 10.1117/12.947815
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States
Abstract
Soft X-ray absorption spectra and spectral sensitivity of X-ray resist are studied using synchrotron radiation. A measurement technique for spectral sensitivity named X-ray Excited Ion Mass Analysis is newly developed. Spectral sensitivity is evaluated from the fragment yield of the decomposed resist during exposure to monochromatized synchrotron radiation. Using this technique, the spectral sensitivity of poly-2-methylpentene-1-sulfone is measured. The sensitivity is found to be enhanced at shorter wavelengths despite a low absorption coefficient.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kozo Mochiji, Takeshi Kimura, Hidehito Obayashi, Hideki Maezawa, "Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947815; https://doi.org/10.1117/12.947815
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KEYWORDS
Absorption

X-rays

Synchrotron radiation

Ions

Chemical analysis

Chemical species

X-ray characterization

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