18 April 1985 Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation
Author Affiliations +
Soft X-ray absorption spectra and spectral sensitivity of X-ray resist are studied using synchrotron radiation. A measurement technique for spectral sensitivity named X-ray Excited Ion Mass Analysis is newly developed. Spectral sensitivity is evaluated from the fragment yield of the decomposed resist during exposure to monochromatized synchrotron radiation. Using this technique, the spectral sensitivity of poly-2-methylpentene-1-sulfone is measured. The sensitivity is found to be enhanced at shorter wavelengths despite a low absorption coefficient.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kozo Mochiji, Kozo Mochiji, Takeshi Kimura, Takeshi Kimura, Hidehito Obayashi, Hidehito Obayashi, Hideki Maezawa, Hideki Maezawa, } "Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947815; https://doi.org/10.1117/12.947815


X-ray spectromicroscopy
Proceedings of SPIE (December 10 2012)
Probing soot particles using laser-based techniques
Proceedings of SPIE (March 17 1994)
Carbon/carbon multilayers for synchrotron radiation
Proceedings of SPIE (November 15 1999)
Characterization of YB66 for use as a soft x ray...
Proceedings of SPIE (January 19 1993)

Back to Top