Structure And Composition Dependence Of The Anisotropy Of The Wet Chemical Etching Of Germanium-Selenium Films

E. ONG; K. L. Tai; R. G. Vadimsky; C. T. Kemmerer; P. M. Bridenbaugh

doi:10.1117/12.947814

18 April 1985 Structure And Composition Dependence Of The Anisotropy Of The Wet Chemical Etching Of Germanium-Selenium Films

E. ONG, K. L. Tai, R. G. Vadimsky, C. T. Kemmerer, P. M. Bridenbaugh

Author Affiliations +

Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985) https://doi.org/10.1117/12.947814
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A model for image formation in the Ag2Se/GexSe1-x resist systems had been proposed by Tai et al.1 The first step of the process consists of forming a thin latent image of photodoped Ag in the top layer of the GexSe_l-x film. This Ag doped layer then serves as a mask for the anisotropic wet chemical etching of the undoped GexSe_l-x structure with a bicomponent etchant. Anisotropic chemical etching results from an unusual, interlocked, phase-separated columnar structure of the GexSe_l-x film. The formation of such phase-separated columnar structures depends on the composition of the Germanium-Selenium film. We examine here the dependence of film microstructure on film composition and describe the relationship bewtween etching characteristics and the concentration ratios of a bicomponent developer.

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E. ONG, K. L. Tai, R. G. Vadimsky, C. T. Kemmerer, and P. M. Bridenbaugh "Structure And Composition Dependence Of The Anisotropy Of The Wet Chemical Etching Of Germanium-Selenium Films", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947814

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