Two Anti-Reflective Coatings For Use Over Highly Reflective Topography

A. T. Jeffries; M. Toukhy; T. R. Sarubbi

doi:10.1117/12.947851

18 April 1985 Two Anti-Reflective Coatings For Use Over Highly Reflective Topography

A. T. Jeffries, M. Toukhy, T. R. Sarubbi

Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985) https://doi.org/10.1117/12.947851
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Two anti-reflective coatings have been developed which eliminate linewidth variation of HPR-204 and HX-256 over stepped highly reflective topography. These anti-reflective coatings are composed of non-photoactive modified polyimides and laser dyes. Thin coatings exhibit the following desirable properties; strong absorption of 436nm light, the ability to dry etch, resistance to flow at 200°C, and good planarization properties.

Citation Download Citation

A. T. Jeffries, M. Toukhy, and T. R. Sarubbi "Two Anti-Reflective Coatings For Use Over Highly Reflective Topography", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947851

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available