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6 May 1985 Disorder And Diffusion In Thin-Film Multilayers
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Abstract
Practical multilayer devices usually have some in-built imperfections that adversely affect their properties. An analysis of the diffraction properties of a multilayer, and its comparison with the results obtained from a theoretical model of a multilayer with imperfections, can give information about the type and magnitude of imperfections in the multilayer. This information can then be used to make multilayers with better characteristics.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. M. Saxena "Disorder And Diffusion In Thin-Film Multilayers", Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); https://doi.org/10.1117/12.949665
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