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6 May 1985 Measured X-ray Performance of Synthetic Multilayers Compared To Calculated Effects of Layer Imperfection
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Abstract
In connection with the manufacture of OVONYXTM multilayer x-ray optical elements, investigations have been carried out into the effects of various types of layer imperfections on the x-ray optical properties of multilayers. These have included extensive numerical modeling of real multilayers (using a computational scheme based on the complete dynamical theory) including simulations of interface diffusion, deviations from constant d-spacing, and interface roughness. Results are presented for several examples of Hf-Si and W-Si multilayers, including comparison of measurements at Cu-Kato the theoretical model.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James L. Wood, Nicola J. Grupido, Keith L. Hart, Steven A. Flessa, Alan M. Kadin, John E. Keem, and David H. Ferris "Measured X-ray Performance of Synthetic Multilayers Compared To Calculated Effects of Layer Imperfection", Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); https://doi.org/10.1117/12.949672
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