6 May 1985 Sputter deposition system for controlled fabrication of multilayers
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A detailed description of a sputter deposition system constructed specifically for the fabrication of x-ray and neutron multilayer monochromators and supermirrors is given. One of the principal design criteria is to maintain precise control of film thickness and uniformity over large substrate areas. Regulation of critical system parameters is fully automated so that response to feedback control information is rapid and complicated layer thickness sequences can be deposited accurately and efficiently. The use of either DC or RF magnetron sources makes it possible to satisfy the diverse material requirements of both x-ray and neutron optics.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. P. Di Nardo, R. P. Di Nardo, P. Z. Takacs, P. Z. Takacs, C. F. Majkrzak, C. F. Majkrzak, P. M. Stefan, P. M. Stefan, } "Sputter deposition system for controlled fabrication of multilayers", Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); doi: 10.1117/12.949648; https://doi.org/10.1117/12.949648


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