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2 January 1986 Computer Controlled E-Beam CC-CD System
Donald J. Evins; Stewart Spiers
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Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949754
Event: 29th Annual Technical Symposium, 1985, San Diego, United States
Abstract
VLSI and ULSI developments aimed at sub-micron geometries require improved measuring systems. A computer controlled cassette to cassette electron beam system has been developed. High resolution of l5nm at lkV is routinely achieved with a unique 4 lens electron optical system. Through-put of the system is 10-15 wafers per hour (5 chips, 1 measurement/chip). An automatic line width measurement method with high accuracy, "The Linear Regression Method"1, has achieved an absolute accuracy of 0.009μm.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Donald J. Evins and Stewart Spiers "Computer Controlled E-Beam CC-CD System", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949754
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