SEM-based System For Calibration Of Linewidth SRMs For The IC industry

D. Nyyssonen; M. T. Postek

doi:10.1117/12.949749

2 January 1986 SEM-based System For Calibration Of Linewidth SRMs For The IC industry

D. Nyyssonen, M. T. Postek

Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949749
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

The National Bureau of Standards is currently developing a new scanning electron microscope-based linewidth measurement system for future calibration of standard reference materials for the IC industry. This system incorporates a piezo/interferometric stage for precise translational motion and the monitoring of distance, improved vibration-isolation, microprocessor stage control system, and computer data analysis. The specifications incorporated into the system are designed for the measurement of linewidth dimensions from 0.1 to 2 μm with a precision of 0.002 μm. The design philosophy of the system is discussed along with the current limitations of accurate edge detection in SEM-based systems.

Citation Download Citation

D. Nyyssonen and M. T. Postek "SEM-based System For Calibration Of Linewidth SRMs For The IC industry", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949749

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