11 September 1985 Methods Of Characterizing Photorefractive Susceptibility Of LiNbO3 Waveguides
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Proceedings Volume 0578, Integrated Optical Circuit Engineering II; (1985) https://doi.org/10.1117/12.950740
Event: 1985 Cambridge Symposium, 1985, Cambridge, United States
Abstract
Two methods for measuring the photorefractive susceptibility of LiNb03 waveguides are reviewed. Data for waveguides formed by means of Ti indiffusion and also by proton exchange techniques are discussed. The photorefractive effect in channel-waveguide devices is analyzed by means of a model which accurately predicts the time evolution of photorefrac-tive effects. The response of guided-wave Mach-Zehnder interferometers is experimentally evaluated, and the magnitudes of the photovoltaic and photoconductive components which com-prise the photorefractive effect are quantitatively determined. While these initial results were obtained for channel-waveguide devices, the model is believed to be extendable to planar-waveguide devices as well.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. A. Becker, "Methods Of Characterizing Photorefractive Susceptibility Of LiNbO3 Waveguides", Proc. SPIE 0578, Integrated Optical Circuit Engineering II, (11 September 1985); doi: 10.1117/12.950740; https://doi.org/10.1117/12.950740
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