1 May 1986 Applications Of Infrared Spectroscopy In The Electronics Industry
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Proceedings Volume 0590, Infrared Technology and Applications; (1986) https://doi.org/10.1117/12.951989
Event: 1985 International Technical Symposium/Europe, 1985, Cannes, France
Non-destructive, rapid optical techniques are particularly amenable to the analysis of semiconductor and device-related materials. This paper briefly considers three particular applications of IR spectroscopy in the routine assessment of electronic materials at the GEC Hirst Research Centre. These include the analysis of impurity levels in silicon, their location and interaction behaviour, the physical and compositional analysis of dielectric glassy films used in planar devices in silicon, and the compositional and thickness mapping of II-VI alloy IR detector materials.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. C. Andrews, D. C. Andrews, "Applications Of Infrared Spectroscopy In The Electronics Industry", Proc. SPIE 0590, Infrared Technology and Applications, (1 May 1986); doi: 10.1117/12.951989; https://doi.org/10.1117/12.951989


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