5 August 1986 Laser Fabrication Of Interconnect Structures On CMOS Gate Arrays
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Proceedings Volume 0621, Manufacturing Applications of Lasers; (1986) https://doi.org/10.1117/12.961147
Event: O-E/LASE'86 Symposium, 1986, Los Angeles, CA, United States
Abstract
Maskless, automated, five minute interconnection of 1000 gate CMOS array die has been accomplished using discretionary laser-induced chemical vapor deposition. Eight 125-stage ring oscillators written on single CMOS gate array die were shown to have the device-limited performance of similar patterns manufactured by photolithographically patterned aluminum-silicon alloy. These results suggest the feasibility of using this method, Laser Pantography (LP), for rapid implementation of prototype and limited volume semicustom VLSI circuits immediately after their design is completed.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John C. Whitehead, John C. Whitehead, Fred Mitlitsky, Fred Mitlitsky, David J. Ashkenas, David J. Ashkenas, Anthony F. Bernhardt, Anthony F. Bernhardt, Steven E. Farmwald, Steven E. Farmwald, James L. Kaschmitter, James L. Kaschmitter, Bruce M. McWilliams, Bruce M. McWilliams, } "Laser Fabrication Of Interconnect Structures On CMOS Gate Arrays", Proc. SPIE 0621, Manufacturing Applications of Lasers, (5 August 1986); doi: 10.1117/12.961147; https://doi.org/10.1117/12.961147
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