Paper
9 July 1986 A Quantitative Assessment Of Image Reversal, A Candidate For A Submicron Process With Improved Linewidth Control
Rupert M.R. Gijsen, Hennie J.J. Kroon, Frans A. Vollenbroek, Rene Vervoordeldonk
Author Affiliations +
Abstract
The performance of the image reversal process is evaluated. As image reversal includes process parameters to control the slope of the resist profile it offers the possibility to compensate for the bulk effect. Additionally dye can be added to the resist to some extent, to reduce reflections at the substrate, without degrading the slope. Data was collected to quantify the potential of image reversal with respect to the latitude for development and exposure dose variations for both the imidazole, the ammonia and the AZ5214 process. Trends indicating how to find the best operating point for each process will be discussed. To demonstrate the submicron capabilities of image reversal resist patterns with lines and spaces down to 0.5 μm over 0.5 μm topography will be shown.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rupert M.R. Gijsen, Hennie J.J. Kroon, Frans A. Vollenbroek, and Rene Vervoordeldonk "A Quantitative Assessment Of Image Reversal, A Candidate For A Submicron Process With Improved Linewidth Control", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); https://doi.org/10.1117/12.963632
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Cited by 17 scholarly publications.
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KEYWORDS
Image processing

Floods

Photoresist processing

Semiconducting wafers

Absorption

Oxides

Process control

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