9 July 1986 Advanced Topics In Lithography Modeling
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Abstract
The model PROLITH is used to simulate advanced topics in lithography such as multi-level resists, contrast enhancement lithography, linewidth variations over topography, antireflective coatings, post-exposure bakes, and dyed photoresists. The applicability and usefulness of this model for these topics is discussed. Other areas in which the model PROLITH may be applied are suggested.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack, "Advanced Topics In Lithography Modeling", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963652; https://doi.org/10.1117/12.963652
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