9 July 1986 Advanced Topics In Lithography Modeling
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Abstract
The model PROLITH is used to simulate advanced topics in lithography such as multi-level resists, contrast enhancement lithography, linewidth variations over topography, antireflective coatings, post-exposure bakes, and dyed photoresists. The applicability and usefulness of this model for these topics is discussed. Other areas in which the model PROLITH may be applied are suggested.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack, Chris A. Mack, } "Advanced Topics In Lithography Modeling", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963652; https://doi.org/10.1117/12.963652
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