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9 July 1986 Desire : A Novel Dry Developed Resist System
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Abstract
We introduce the DESIRE system, a noval approach to dry developed resist systems. DESIRE is a single layer system based on selective silylation. The optical spatial information is translated into silicon being built into the resin during the silylation treatment. A negative working version will be discussed. The process flow is given and a set of results showing submicron dimensions with high aspect ratio and good linewidth control are presented. The excellent features of the system make it a possible candidate for use in submicron applications with UV exposure tools.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fedor Coopmans and Bruno Roland "Desire : A Novel Dry Developed Resist System", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); https://doi.org/10.1117/12.963623
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