9 July 1986 EPA 914 IR - A Positive Resist With Built-In Image Reversal (IR) Capabilities For Ulsi Technology
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Abstract
In order to extend the use of the EPA 914 into the submicron range, using conventional lithographic production tools, a modified version, EPA 914 IR has been formulated which is expected to have a shelf-life stability approaching conventional positive resists and allowing it to operate in a "negative" mode, without requiring the IMTEC/YES approach. The lithographic evaluation of EPA 914 IR described herein considers the following lithographic properties using both the Micralign 600-552HT and the GCA DSW 6000: *1. Linewidth control for both isolated/group lines. *2. Depth of focus vs. CD. 3. Linewidth control for nominal,--1.00 micron lines/spaces. 4. The effect of the following process parameters on lithographic properties (1-3) will be considered as well: a) Initial exposure b) Post-exposure bake c) Flood exposure d) Develop condition(s)
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William F. Cordes, William F. Cordes, David A. Sawoska, David A. Sawoska, Allen C. Spencer, Allen C. Spencer, Edwin J. Turner, Edwin J. Turner, } "EPA 914 IR - A Positive Resist With Built-In Image Reversal (IR) Capabilities For Ulsi Technology", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963648; https://doi.org/10.1117/12.963648
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