9 July 1986 New Deep Uv Dyeable Negative Resist For CCD Micro Color Filter
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Abstract
Several kinds of dyeable negative photoresist materials for CCD micro color filters, developed in our Laboratories, are reported. Quaternary ammonium salt-terminating acrylate-glycidyl methacrylate copolymers with bisazides have been developed as negative working resists. Descriptions on their synthesis, lithographic data and the micro color filter process for these resists are mentioned.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shin-ichi Sanada, Masataka Miyamura, "New Deep Uv Dyeable Negative Resist For CCD Micro Color Filter", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963640; https://doi.org/10.1117/12.963640
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