Simultaneous Vapor Deposition Of Metal And Monomeric Compounds: Lithographic Applications

H. Hiraoka; J. Duran

doi:10.1117/12.963657

9 July 1986 Simultaneous Vapor Deposition Of Metal And Monomeric Compounds: Lithographic Applications

H. Hiraoka, J. Duran

Proceedings Volume 0631, Advances in Resist Technology and Processing III; (1986) https://doi.org/10.1117/12.963657
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

We have published methods for bringing highly reactive metal atoms and/or ions and volatile organic monomers together in the vapor phase, thus achieving deposition of uniform metal-containing polymer films on a desired substrate. In the present study of blending of gold and other metals with polyimides, an evaporated gold vapor was mixed with vapors of aromatic dicarboxylic dianhydride and of oxydianiline to deposit uniform films on the substrate. Deposited polymer films were heated at 300°C on a hot plate to remove an excess of either monomer, and to convert the polyamic acid to the polyimide films. An optical absorption band due to gold clusters in the films appeared around 600 nm. The resulting polyimide film was image-wise delineated, using a silicon-containing photo-resist and oxygen RIE, to give relief images with vertical wall profiles. The oxygen RIE rate was measured as a function of the gold content in the films. As long as gold particles are isolated, the RIE rate is not reduced significantly. This kind of imaging technology with a heavy gold content which produces polyimide films may be useful in x-ray mask fabrication and other processes. Polymer films other than polyimides with gold clusters have been reported.2'3

Citation Download Citation

H. Hiraoka and J. Duran "Simultaneous Vapor Deposition Of Metal And Monomeric Compounds: Lithographic Applications", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); https://doi.org/10.1117/12.963657

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