Advanced X-Ray Alignment System

B. S. Fay; W. T. Novak

doi:10.1117/12.963679

30 June 1986 Advanced X-Ray Alignment System

B. S. Fay, W. T. Novak

Proceedings Volume 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V; (1986) https://doi.org/10.1117/12.963679
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

Step and repeat X-ray lithography is essential for achieving the fine lines, accurate registration, and extreme density required to produce the next generation of very large scale integrated circuits. Drawing upon its own experience in developing a full-field X-ray lithography system [1], as well as upon technology developed at companies such as Thomson-CSF [2] and AT&T [3], Micronix Corporation in Los Gatos, California, is introducing such a system, called the MX-1600.

Citation Download Citation

B. S. Fay and W. T. Novak "Advanced X-Ray Alignment System", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); https://doi.org/10.1117/12.963679

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