30 June 1986 Fib Mask Repair With Microtrim
Author Affiliations +
Abstract
A FIB (focused ion beam) system for the repair of clear and opaque photomask defects is described. FIB technology is uniquely capable of repairing submicron clear and opaque defects. Opaque defects are repaired by ion beam sputtering. Clear defects are repaired by the deposition of a tenaciously adherent, opaque carbon film from a hydrocarbon gas. A number of mask repair examples are shown, and the results of adhesion and chemical resistance tests of the carbon films are presented.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henry C. Kaufmann, William B. Thompson, and Gregory J. Dunn "Fib Mask Repair With Microtrim", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963669; https://doi.org/10.1117/12.963669
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Repair Of Dear Defects On X Ray Masks By Ion...
Proceedings of SPIE (July 31 1989)
Issues in the repair of x-ray masks
Proceedings of SPIE (February 28 1991)
X-ray mask defect repair optimization
Proceedings of SPIE (June 24 1999)
Focused ion beams for x-ray mask repair
Proceedings of SPIE (November 02 1994)
0.25-um x-ray mask repair with focused ion beams
Proceedings of SPIE (June 23 1993)

Back to Top