30 June 1986 Metal Deposition By Electron Beam Exposure Of An Organometallic Film
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Abstract
We describe a method of metal deposition by electron beam exposure and pyrolysis of a gold containing organometallic polymer. We have demonstrated the formation of metal patterns on Si, GaAs, and multilayer resist systems with line widths as small as 0.25 μm. There has been considerable work on direct deposition of materials by laser driven processes. These methods usually involve depositions of films by pyrolysis or photolysis of gas phase precursors. The handling of these reactive gases, which can be a problem, was eliminated in a recently described technique of laser pyrolysis of solid organometallic films. In this technique, heat from a focused laser beam decomposes an organometallic polymer removing the organic component and leaving a metal film. Organometallic polymers are commercially available with a wide range of metals and have been used for optical, electrical and decorative coatings. The advantage of the organometallic films is that no vacuum film deposition is required and the handling is similar to standard photoresist processing. The laser thermal process provides a way of forming patterns in this material, but the spatial resolution is limited by both the diffraction of light and thermal diffusion making submicrometer dimensions difficult to obtain.
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L. M. Schiavone, L. M. Schiavone, H. G. Craighhead, H. G. Craighhead, } "Metal Deposition By Electron Beam Exposure Of An Organometallic Film", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963692; https://doi.org/10.1117/12.963692
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