30 June 1986 Submicron Proximity Correction By The Fourier Precompensation Method
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Abstract
The Fourier and Haar transforms have been successfully employed to produce fast, efficient proximity correction calculations for electron beam lithography. The Fourier transform is used in a precompensation operation that generates a nearly exact solution to the proximity problem. The Haar transform is used to thin or reduce the size of the extremely accurate but large corrected database that results. The methodology here constitutes a signal processing or transform oriented approach to proximity correction. It has the advantage that fast digital hardware is commercially available for making accelerated computations. Detailed computer generated simulations and experimental results are presented for four different test patterns. The critical lithography features are nested gaps between large features and isolated lines and squares ranging from 0.2 to 0.5 μm. The Fourier precompensation proximity correction approach successfully preserves the fidelity of these features as well as all other features in the test patterns.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael E. Haslam, Michael E. Haslam, John F. McDonald, John F. McDonald, } "Submicron Proximity Correction By The Fourier Precompensation Method", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963667; https://doi.org/10.1117/12.963667
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