30 June 1986 Toward Submicron A New Phase Of Optical Stepper
Author Affiliations +
According to the progress of the LSI design rule, optical lithography has steadily opened its new frontier. As the dimension of the LSI design rules becomes the same as that of the resolution limit, the required image quality becomes higher and higher. Optical lithography corresponded to such requirements by the development of the lens design and simulation technique. Some of the new results are shown in this paper, and the new submicron stepper of 0.8 μm shall be introduced as the fruit of such technique. In addition, some of the new developments which correspond to the submicron lithography are introduced. As a consequence, the future of optical lithography shall be discussed in view of the recent aim of 0.5 μm.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Akiyoshi Suzuki, Ryusho Hirose, and Youichi Hirabayashi "Toward Submicron A New Phase Of Optical Stepper", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); doi: 10.1117/12.963681; https://doi.org/10.1117/12.963681


Triple AIM evaluation and application in advanced node
Proceedings of SPIE (March 07 2016)
Resolution And Overlay Of Submicron I-Line Wafer Steppers
Proceedings of SPIE (December 31 1987)
Spacer process and alignment assessment for SADP process
Proceedings of SPIE (March 12 2012)
Advances In 1:1 Optical Lithography
Proceedings of SPIE (December 31 1986)
Characterization And Setup Techniques For A 5X Stepper
Proceedings of SPIE (August 19 1986)

Back to Top